日本YAMATO等離子清洗機(jī)PR500/510：
| Gas Plasma Etcher |
| PR500/PR510 |
| Model | | 500 | 510 | | Method | Barrel type of DP
DP : direct plasma | | High-frequency Output | | Max.500W | | Oscillating Frequency | | 13.56MHz | | Reaction Chamber | | ?215×305mm |
| The PR500/510 isagasplasma device that is used widely for such applicationsasproductionof semiconductors and analysis work. Itboastsoutstandingoperability and safety, with an automatic tuningsystemas a standardcomponent and other features. - It has a compact design,withasmall-size HF generator and an oscillation sectionintegratedwitha portion of the chamber.
- With the 215mm diameterlargecaliberchamber, the unit can process bigtestingsamples.
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 The gas plasmaequipment has a wide range ofapplications fromashing, etching,dry cleaning,etc. |
 Operation Flowchart |
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| Piping System Diagram |
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| Specifications |
| Model | PR500 | PR510 |
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 Method | Barrel type of direct plasma | | Controlpart | | Highfrequency output | Max.500W | | Oscillating frequency | 13.56MHz | | Outputimpedance | 50Ω | | Tuningmethod | Automatic tuning | | Instrument | Output watt meter (0 to 600W)
Reflected wave watt meter (0 to 300W)
Vacuum gauge, thermocouple type
Flow meter, needle valve integrated type, 2 sets | | Timer | 0.1sec. to 999h | | Gasinlet | 1/4"stainless steel, 2 inlet | | Powersource (50/60Hz) | AC100/220V, single phase, 2 kVA | | Reactionpart | | Reactionchamber | Madeof quarts, φ215×305mm | | Electrodestructure | Condenser type, 4-way split | | Controlsystem | Autopressurereduction, auto leak valve | TouchpanelwithPLC control | | Pipingmaterial | SUS,Teflon | | Externaldimensions(W×D×Hmm) | 438×520×760 | 520×630×760 | | Weight | Approx.38kg | Approx.60kg | | StandardAccessories | | | - Connection cable :1completeset
- Vacuum grease : 1 pc.
- O-ring for reaction chamber:1pc.
| | OptionalAccessories | Frame for wafers, 2, 3,4,5, 6 inches Multipurposeangledframe
Aluminum etchingtunnelStand |
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